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Seminar
Surface- and Device-Functionalization by Dip-Pen Nanolithography and Polymer Pen Lithography
Wednesday, 15 July 2015, 13:30-15:00
Talk given by Dr. Dr. Michael Hirtz
Institute of Nanotechnology (INT) & Karlsruhe Nano Micro Facility (KNMF),
Karlsruhe Institute of Technology (KIT)
Abstract: Dip-Pen Nanolithography (DPN) and Polymer Pen Lithography (PPL) offer unique lithographic options for the patterning of surfaces. DPN utilizes the tip of an atomic force microscope (AFM) as a kind of miniature quill pen to enable high resolution patterning down to the nanometer scale. Offering mild processing parameters (ambient, low temperature) and a wide range of substances and substrate materials for patterning, additionally, DPN allows for multiplexing, i.e. the placement of different materials close-by or even intercalated within a micro- to nanosized pattern. PPL is combining aspects from DPN and microcontact printing (μCP): as in μCP an elastomeric stamp is used, but in PPL it consists of a large array of pyramidal features that – enabled due to the precision control of the AFM setup – act as individual pens like in DPN. This enables arbitrary pattern generation with the same stamp as well as multiplexing, in contrast to classical μCP. Furthermore, PPL inherits the large area printing and high parallelization capabilities of μCP.
In this talk, I will highlight recent contributions from our group to advance DPN and
PPL, especially for applications in bioactive surface patterning and functionalization of
sensor devices and photonic structures: DPN with phospholipids (L-DPN) offers unique
opportunities to pattern multiplexed biomimetic membrane patches onto surfaces and
devices. Applications in the functionalization of whispering gallery mode goblet
structures, diamond photonic circuits and graphene devices are presented. A novel
approach in multiplexing by PPL will be discussed, enabling fully multiplexed,
interdigitated surface patterns as well as parallel multiplexed functionalization of dense
device arrays. Finally, a recently developed model on the writing process in L-DPN
sheds light on a microscopic understanding of the processes involved in the lithography.
This event is part of the eventgroup INT Talks
Homepage
https://www.int.kit.edu/events.php
https://www.int.kit.edu/events.php
Organizer
Prof. Dr.-Ing. Horst Hahn
Institute of Nanotechnology (INT)
Karlsruhe Institute of Technology (KIT)
Eggenstein-Leopoldshafen
Mail: horst hahn ∂ kit edu
Prof. Dr.-Ing. Horst Hahn
Institute of Nanotechnology (INT)
Karlsruhe Institute of Technology (KIT)
Eggenstein-Leopoldshafen
Mail: horst hahn ∂ kit edu
Targetgroup
Interested / Everyone
Interested / Everyone