INT Home | Legals | Data Protection | Sitemap | INT-ra Net | KIT


For our research we are developing and using the following techniques:

  • Nanofabrication (multi-layer e-beam lithography, reactive ion etching, sputtering, atomic-layer deposition, packaging)
  • Electric-field assisted deposition techniques (Dielectrophoresis)
  • Voltage-contrast scanning electron microscopy
  • Photocurrent spectroscopy and imaging
  • Electroluminescence spectroscopy and imaging
  • Raman spectroscopy and imaging
  • Semiconductor parameter analysis and charge transport 
Raman EL-Setup Probe Station
Sample preparation Electron microscope